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1

Threshold voltage shift of submicron p-channel MOSFET due to Si surface damage from plasma etching process

Gwan-Ha Kim, Young-Rog Kang, Whan-Jun Kim, Sang-Yong Kim, Chang-Il Kim

Journal:

Thin Solid Films

Year:

2007

Language:

english

File:

PDF, 750 KB

english, 2007

2

Temperature dependence on dry etching of Al[sub 2]O[sub 3] thin films in BCl[sub 3]/Cl[sub 2]/Ar plasma

Yang, Xue, Kim, Dong-Pyo, Um, Doo-Seung, Kim, Gwan-Ha, Kim, Chang-Il

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2009

Language:

english

File:

PDF, 920 KB

english, 2009

3

Selective etching of SiO2 over Si3N4 in a C5F8/O2/Ar plasma

Gwan-Ha Kim, Seung-Bum Kim, Chang-Il Kim

Journal:

Microelectronic Engineering

Year:

2006

Language:

english

File:

PDF, 1.10 MB

english, 2006

4

Selective etching of (Ba,Sr)TiO3 thin films over silicon in an inductively coupled plasma

Gwan-Ha Kim, Chang-Il Kim

Journal:

Microelectronic Engineering

Year:

2007

Language:

english

File:

PDF, 794 KB

english, 2007

5

Inductively coupled Cl2/N2 plasma: Experimental investigation and modeling

Gwan-Ha Kim, A.M. Efremov, Dong-Pyo Kim, Chang-Il Kim

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 191 KB

english, 2005

6

Dry etching of (Pb,Sr)TiO[sub 3] thin films using inductively coupled plasma

Kim, Gwan-Ha, Kim, Jong-Sik, Kim, Kyoung-Tae, Kim, Dong-Pyo, Kim, Chang-Il

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2005

Language:

english

File:

PDF, 421 KB

english, 2005

7

Effect of Cl[sub 2]∕Ar gas mixing ratio on (Pb,Sr)TiO[sub 3] thin film etching behavior in inductively coupled plasma

Kim, Gwan-Ha, Kim, Chang-Il

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2006

Language:

english

File:

PDF, 621 KB

english, 2006

8

Etching Properties of HfO 2 Thin Films in Cl 2 /BCl 3 /Ar Plasma

Kim, Dong-Pyo, Kim, Gwan-Ha, Woo, Jong-Chang, Yang, Xue, Um, Doo-Seung, Kim, Chang-Il

Journal:

Year:

2009

Language:

english

File:

PDF, 2.48 MB

english, 2009

9

Etching Characteristics of (Na 0.5 K 0.5 )NbO 3 Thin Films in an Inductively Coupled Cl 2 /Ar Plasma

Kang, Chan Min, Kim, Gwan-Ha, Kim, Kyoung-Tae, Kim, Chang-Il

Journal:

Year:

2007

Language:

english

File:

PDF, 1.10 MB

english, 2007

10

Effect of LaNiO3 electrode on microstructural and ferroelectric properties of Bi3.25Eu0.75Ti3O12 thin films

Kyoung-Tae Kim, Chang-Il Kim, Jong-Gyu Kim, Gwan-Ha Kim

Journal:

Thin Solid Films

Year:

2007

Language:

english

File:

PDF, 611 KB

english, 2007

11

Etch characteristics of (Pb,Sr)TiO[sub 3] thin films using CF[sub 4]/Ar inductively coupled plasma

Kim, Gwan-Ha, Kim, Kyoung-Tae, Kim, Dong-Pyo, Kim, Chang-Il

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2003

Language:

english

File:

PDF, 441 KB

english, 2003

12

Dry etching of LaNiO3 thin films using inductively coupled plasma

Gwan-Ha Kim, Dong-Pyo Kim, Kyoung-Tae Kim, Chang-Il Kim, Cheol-In Lee, Tae-Hyung Kim

Journal:

Thin Solid Films

Year:

2006

Language:

english

File:

PDF, 226 KB

english, 2006

13

Etching mechanism of (Pb,Sr)TiO3 thin films for DRAM application using Cl2/Ar inductively coupled plasma

Gwan-Ha Kim, Kyoung-Tae Kim, Dong-Pyo Kim, Chang-Il Kim

Journal:

Year:

2004

Language:

english

File:

PDF, 213 KB

english, 2004

14

Improving the Etch Selectivity of ZrO 2 Thin Films over Si by Using High Density Plasma

Woo, Jong-Chang, Kim, Gwan-Ha, Kim, Dong-Pyo, Um, Doo-Seung, Kim, Chang-Il

Journal:

Year:

2009

Language:

english

File:

PDF, 3.07 MB

english, 2009

15

Synthesis and purification of single-walled carbon nanotubes by methane decomposition over iron-supported catalysts

Kim, Jong-Sik, Kim, Gwan-Ha, Kim, Chang-Il

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2006

Language:

english

File:

PDF, 593 KB

english, 2006

16

Applicability of self-consistent global model for characterization of inductively coupled Cl2 plasma

A.M. Efremov, Gwan-Ha Kim, Jong-Gyu Kim, A.V. Bogomolov, Chang-Il Kim

Journal:

Year:

2007

Language:

english

File:

PDF, 236 KB

english, 2007

17

A study on dry etching for profile and selectivity of ZrO2 thin films over Si by using high density plasma

Jong-Chang Woo, Sang-Gi Kim, Jin-Gun Koo, Gwan-Ha Kim, Dong-Pyo Kim, Chong-Hee Yu, Jin-Yeong Kang, Chang-IL Kim

Journal:

Thin Solid Films

Year:

2009

Language:

english

File:

PDF, 986 KB

english, 2009

18

Effect of gas mixing ratio on MgO etch behaviour in inductively coupled BCl3/Ar plasma

Gwan-ha Kim, Chang-Il Kim, Alexander M. Efremov

Journal:

Year:

2005

Language:

english

File:

PDF, 271 KB

english, 2005

19

Dry Etching Mechanisms of ZrO 2 Thin Films in BCl 3 /Cl 2 /Ar Plasma

Lee, Cheol-In, Kim, Gwan-Ha, Kim, Dong-Pyo, Woo, Jong-Chang, Kim, Chang-Il

Journal:

Year:

2009

Language:

english

File:

PDF, 3.49 MB

english, 2009

20

Etching characteristic and mechanism of BST thin films using inductively coupled Cl2/Ar plasma with additive CF4 gas

Gwan-Ha Kim, Kyoung-Tae Kim, Dong-Pyo Kim, Chang-Il Kim

Journal:

Thin Solid Films

Year:

2004

Language:

english

File:

PDF, 121 KB

english, 2004

21

(Pb,Sr)TiO3 thin films etching characteristics using inductively coupled plasma

Gwan-Ha Kim, Kyoung-Tae Kim, Dong-Pyo Kim, Chang-Il Kim

Journal:

Thin Solid Films

Year:

2004

Language:

english

File:

PDF, 114 KB

english, 2004

22

Characteristics of Nickel-doped Zinc Oxide thin films prepared by sol–gel method

Kyoung-Tae Kim, Gwan-Ha Kim, Jong-Chang Woo, Chang-Il Kim

Journal:

Surface and Coatings Technology

Year:

2008

Language:

english

File:

PDF, 789 KB

english, 2008

23

On the applicability of self-consistent global model for the characterization of Cl2/Ar inductively coupled plasma

A.M. Efremov, Gwan-Ha Kim, Jong-Gyu Kim, A.V. Bogomolov, Chang-Il Kim

Journal:

Microelectronic Engineering

Year:

2007

Language:

english

File:

PDF, 317 KB

english, 2007

24

Controlling temperature dependence of silicon waveguide using slot structure

Lee, Jong-Moo, Kim, Duk-Jun, Kim, Gwan-Ha, Kwon, O-Kyun, Kim, Kap-Joong, Kim, Gyungock

Journal:

Year:

2008

Language:

english

File:

PDF, 913 KB

english, 2008

25

Dry etching of (Ba,Sr)TiO[sub 3] thin films using an inductively coupled plasma

Kim, Gwan-Ha, Kim, Kyoung-Tae, Kim, Chang-II

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2005

Language:

english

File:

PDF, 428 KB

english, 2005

26

Dielectric Properties of (Pb,Sr)TiO 3 Heterolayered Thin Films for Tunable Application

Kim, Kyoung-Tae, Woo, Jong-Chang, Kim, Chang-Il, Kim, Gwan-Ha, Lee, Sung-Gap, Lee, Cheol-In

Journal:

Year:

2007

Language:

english

File:

PDF, 665 KB

english, 2007

27

The Etching Properties of Al 2 O 3 Thin Films in BCl 3 /Cl 2 /Ar Plasma

Xue-Yang,, Kim, Dong-Pyo, Kim, Gwan-Ha, Woo, Jong-Chang, Um, Doo-Seung, Kim, Chang-Il

Journal:

Year:

2009

Language:

english

File:

PDF, 2.64 MB

english, 2009

28

Etching characteristics of LaNiO[sub 3] thin films in BCl[sub 3]∕Ar gas chemistry

Kim, Gwan-Ha, Kim, Chang-Il

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2006

Language:

english

File:

PDF, 389 KB

english, 2006

29

Etch Properties of Hf-Based High- k Dielectrics Using Inductively Coupled Plasma

Kim, Gwan-Ha, Kim, Kyoung-Tae, Woo, Jong-Chang, Kim, Chang-Il

Journal:

Year:

2007

Language:

english

File:

PDF, 732 KB

english, 2007

30

Dry etching of magnesium oxide thin films by using inductively coupled plasma for buffer layer of MFIS structure

Gwan-Ha Kim, Chang-Il Kim

Journal:

Thin Solid Films

Year:

2007

Language:

english

File:

PDF, 782 KB

english, 2007

31

Plasma etching of (Ba,Sr)TiO3 thin films using inductively coupled Cl2/Ar and BCl3/Cl2/Ar plasma

Gwan-Ha Kim, Kyoung-Tae Kim, Dong-Pyo Kim, Chang-Il Kim

Journal:

Thin Solid Films

Year:

2005

Language:

english

File:

PDF, 378 KB

english, 2005

32

Self-consistent global model for inductively coupled Cl2 plasma: Comparison with experimental data and application for the etch process analysis

A.M. Efremov, Gwan-Ha Kim, Jong-Gyu Kim, Chang-Il Kim

Journal:

Thin Solid Films

Year:

2007

Language:

english

File:

PDF, 255 KB

english, 2007

33

Dielectric Properties of (Na, K)NbO 3 Thin Films for Tunable Microwave Device Application

Kim, Kyoung-Tae, Kim, Gwan-Ha, Woo, Jong-Chang, Kim, Chang-Il

Journal:

Year:

2007

Language:

english

File:

PDF, 1.24 MB

english, 2007

34

Etch damage evaluation on (Bi4−xLax)Ti3O12 thin films during the etch process using inductively coupled plasma sources

Jong-Gyu Kim, Gwan-Ha Kim, Kyoung-Tae Kim, Chang-Il Kim

Journal:

Materials Science in Semiconductor Processing

Year:

2006

Language:

english

File:

PDF, 632 KB

english, 2006

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